Advertisements
Advertisements
Question
- Assertion (A): Putting the p-type semiconductor slab directly in physical contact with the n-type semiconductor slab cannot form the pn junction.
- Reason (R): The roughness at contact will be much more than inter atomic crystal spacing and continuous flow of charge carriers is not possible.
Options
If both Assertion and Reason are true and Reason is the correct explanation of Assertion.
If both Assertion and Reason are true but Reason is not the correct explanation of Assertion.
If Assertion is true but Reason is false.
If both Assertion and Reason are false.
Solution
If both Assertion and Reason are true and Reason is the correct explanation of Assertion.
Explanation:
A pn junction cannot be formed by physically contacting a p-type semiconductor slab with an n-type semiconductor slab. The roughness upon contact does not match the inter-atomic crystal spacing of about 2-3 Å, resulting in a discontinuity. As a result, a continuous flow of charge carriers is impossible. So both the statement and the reason are correct, and the reason explains the assertion.
APPEARS IN
RELATED QUESTIONS
Distinguish between 'intrinsic' and 'extrinsic' semiconductors
The number of silicon atoms per m3 is 5 × 1028. This is doped simultaneously with 5 × 1022 atoms per m3 of Arsenic and 5 × 1020 per m3 atoms of Indium. Calculate the number of electrons and holes. Given that ni= 1.5 × 1016 m−3. Is the material n-type or p-type?
In a p-type semiconductor, the acceptor impurity produces an energy level ______
A donor impurity results in ______.
In n-type semiconductor, the fifth electron ______.
When p-n junction diode is forward biased, then ______.
Distinguish between n-type and p-type semiconductors.
Sn, C, and Si, Ge are all group XIV elements. Yet, Sn is a conductor, C is an insulator while Si and Ge are semiconductors. Why?
Suppose a ‘n’-type wafer is created by doping Si crystal having 5 × 1028 atoms/m3 with 1 ppm concentration of As. On the surface 200 ppm Boron is added to create ‘P’ region in this wafer. Considering n i = 1.5 × 1016 m–3, (i) Calculate the densities of the charge carriers in the n and p regions. (ii) Comment which charge carriers would contribute largely for the reverse saturation current when diode is reverse biased.
With an increase in the temperature, the electrical conductivity of a semiconductor ______.